Before the founding of the PRC, there existed a model similar to the national system in China. After the founding of the PRC, China established a traditional national system based on planned economy. After the reform and opening up, with the transition of China’s economic system from planned economy to market economy, China’s national system is constantly changing; Influenced by changes in the external environment, after the 18th National Congress of the Communist Party of China, the new national system moved to the front of the new era and became one of the important ways to solve the “stuck neck” problem. Under the new historical conditions, the success of the double-layer collaborative research and development model of the latest generation of EUV lithography machine can provide useful reference for how to improve the new national mechanism.